Research and application of epoxy resin has been a topic of interest. Because of its excellent solvent resistance, acid and alkali resistance, as well as the excellent metal adhesion, good thermal stability and electrical insulation, color retention, etc., it is still the automotive industry, electrical industry, aviation industry and cutting-edge industries, etc., occupy an irreplaceable position. However, no photochemical activity of epoxy resin, which makes the application of epoxy resin subject to certain restrictions. China phenolic resin network (www.pf-e.cn) experts, had modified F-44 epoxy resin, synthesized containing both epoxy and acrylic-based photosensitive containing phenolic resin, modified After the resin not only retain the advantages of the general F type epoxy resin, and the introduction of light Minji Group F-44 resin to the modified application to bring the convenience and expanded applications. In this paper, photosensitive phenolic epoxy acrylic resin production process for further study in order to find a cheap, safe and nontoxic catalysts to replace expensive quaternary ammonium bromide, to reduce production costs, the purpose of optimizing the production process . China phenolic resin network (www.pf-e.cn) experts to acrylic acid and F-44 epoxy resin as raw materials, synthesized containing both epoxy and acrylic-based photosensitive containing phenolic epoxy acrylate resin. Type of catalyst, catalyst amount, reaction time and reaction temperature on conversion of acrylic acid. The results found that triethylamine as catalyst, the reaction temperature is 95 ℃, catalyst amount is 2% for the resin, the esterification reaction completed within 6h of the coating made of synthetic resin with excellent mechanical properties, solvent resistance and acid properties. By FT-IR structure of the synthetic resin were characterized. (A) Introduction Research and application of epoxy resin scientists and engineers has been a topic of interest. According to phenolic resin network (www.pf-e.cn) experts, because of its excellent solvent resistance, acid and alkali resistance, as well as the excellent metal adhesion, good thermal stability and electrical insulation , Color, etc., is still the automotive industry, electrical industry, aviation industry, and cutting-edge industries and so occupy an irreplaceable position. However, no photochemical activity of epoxy resin, which makes the application of epoxy resin subject to certain restrictions. The research team had modified F-44 epoxy resin, synthesized containing both epoxy and acrylic-based photosensitive containing phenolic epoxy resin, modified resin, not only retained a general class of epoxy resin F advantages, and the introduction of light Minji Group F-44 resin to the modified application to bring the convenience and expanded applications. In this paper, photosensitive phenolic epoxy acrylic resin production process for further study in order to find a cheap, safe and nontoxic catalysts to replace expensive quaternary ammonium bromide, to reduce production costs, the purpose of optimizing the production process . (B) Experimental 1, the main raw material F-44 epoxy resin (epoxy value 0.44): Domestic; dioxane (b alkyl): AR, Shanghai Reagent three plants; of hydroquinone: chemical pure, reagent plant in Chongqing electronic materials; ethyl - on - dimethylamino benzoate (EDAB) sensitive promoter, isopropyl Thioxanthone (ITX) photosensitizer: The United States co-Tak International Limited times; three trimethylol propyl acrylate (TMPTA) to pay Joint agent: Chemical companies of Belgium UCB; acid: chemical pure, Shanghai Chemical Reagent five joint; maleic anhydride: AR, Tianjin Chemical Reagent Factory. 2, the main instrument Samples using infrared spectroscopy instruments produced by the United States IMPACT420 NICOLET FTIR spectrometer type; product of photochemical activity of UV exposure with a self-made instrument for exposure, according to Chinese phenolic resin network (www.pf-e.cn) experts, and then measured by the infrared spectrometer double bond content changes before and after exposure, UV lamp power 1000W, the distance from the sample tube 26cm; film adhesion experimental material with the original Tianjin Factory production QFZ-Ⅱ type of film adhesion experimental measured .

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